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Journal of Mechanical Engineering Science and Technology (JMEST)

Abstract

Thin films of MnO2 were successfully deposited onto Si substrates using the magnetron sputtering technique in various gas atmospheres and deposition times to study their influence on the structural, morphological, electrical, and electrochemical properties for application as supercapacitor electrodes. Structural analysis using XRD showed that deposition under an Ar+O2 gas atmosphere increased the crystallite size and crystallinity of the Si/MnO2 films, while shorter deposition times reduced the crystallite size and lowered the crystallinity. Surface morphology observation using SEM showed that the film deposited in an Ar+O2 gas atmosphere had smaller, more uniform, evenly distributed, and closely packed grain sizes. Conversely, shorter deposition times result in larger apparent grain and pore sizes. Electrical properties measured using a four-point probe showed an increase in electrical conductivity for films deposited with an Ar+O2 gas atmosphere, while shorter deposition times decreased conductivity. Electrochemical performance measurements using CV showed that under atmospheric Ar+O2 conditions, the specific capacitance increased to 9.80 μF/cm2, but decreased under shorter deposition times. The enhanced electrochemical performance is attributed to the film structure, which has smaller apparent pores and a more uniform grain size distribution, along with low resistivity, facilitating better electron transport pathways. Overall, the results of this study indicate that controlling gas flow conditions and deposition time during the sputtering process are important factors in adjusting the properties of Si/MnO2. This study provides important insights for the optimization of Si/MnO2-based electrodes for future energy storage applications.

Publisher

State University of Malang (UM)

First Page

76

Last Page

91

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